SYNTHESIS AND PROPERTIES OF COPPER NICKEL SELENIDE (CuNiSe) THIN FILM BY CHEMICAL BATH DEPOSITION METHOD.

27 PAGES (9044 WORDS) Industrial Physics Project


Abstract:

Thin films of Copper Nickel Selenide (CuNiSe) were synthesized on glass slides at room temperature using chemical bath deposition (CBD) method. The films were deposited from aqueous solution containing copper ion, nickel ion and potassium selenate (K2SeO4) at varying molar concentration of nickel ion with constant time and pH of the reaction bath. The optical absorption data reveals that films of CuNiSe absorbs strongly at the ultraviolet range of 300 nm and has above 60% transmittance in the visible–near infrared regions. The results revealed high average band gap energy that ranges between 2.8 eV to 3.5 eV. Average particle size films obtained ranges from 6.46 nm to 15.66 nm. The film is found suitable for window layer in p-n junction solar cell.



TABLE OF CONTENTS

 

Title page --------------------------------------------------------------------------------- i

Declaration --------------------------------------------------------------------------------ii

Certification ----------------------------------------------------------------------------- iii

Dedication ------------------------------------------------------------------------------- iv

Acknowledgement ---------------------------------------------------------------------- v

Table of contents -------------------------------------------------------------------------vi

List of tables -------------------------------------------------------------------------------x

List of figures ----------------------------------------------------------------------------xi

Abstract --------------------------------------------------------------------------------- xiii

 

     CHAPTER ONE

1.1            Introduction -------------------------------------------------------------------------1

1.2            Background of study ---------------------------------------------------------------4

1.3            Statement of Problem---------------------------------------------------------------4

1.4            Aim and objectives of the study -------------------------------------------------- 5

1.5            Purpose of the study -----------------------------------------------------------------6

1.6            Scope of study ------------------------------------------------------------------------6

 

CHAPTER TWO

2.1 Literature Review -------------------------------------------------------------------7

2.2 Methods of Thin Film Deposition -----------------------------------------------12

2.3 Film Measurement Techniques ------------------------------------------------- 17

 

       CHAPTER THREE

3.1 Materials and Method -------------------------------------------------------------20

3.1.1 Material preparation ----------------------------------------------------------- 21

3.1.1.1 Copper (ii) chloride dihydrate -----------------------------------------------21

3.1.1.2 Nickel (ii) chloride hexahydrate --------------------------------------------22

3.1.1.3 Disodium ethylene diamine tetracetate ------------------------------------22

3.1.1.4 Potassium selenite ------------------------------------------------------------23

3.1.1.5 Ammonium solution -------------------------------------------------------- 23

3.2 Deposition of Copper Aluminum Selenide films -----------------------------23

3.3 Characterization of the fabricated thin film -----------------------------------25

 

        CHAPTER FOUR

4.1 Result and Discussion -----------------------------------------------------------26

4.1.2 Transmittance ------------------------------------------------------------------27

4.1.3 Reluctance ------------------------------------------------------------------- 28

4.1.4 Reluctance Index -------------------------------------------------------------29

4.1.5 Extinction Coefficient ------------------------------------------------------ 30

4.1.6 Real Dielectric Constant -----------------------------------------------------31

4.1.7 Imaginary Dielectric Constant ----------------------------------------------32

4.1.8 Optical Conductivity -------------------------------------------------------- 33

4.1.9 Optical Band Gap -------------------------------------------------------------34

4.1.10 Average Optical Thickness -------------------------------------------------35

CHAPTER FIVE 

 5.0       Discussion, Conclusion and Recommendations

REFERENCES

CHAPTER FIVE
5.0 Discussion, Conclusion and Recommendations
CHAPTER FIVE
5.0 Discussion, Conclusion and Recommendations