Maximization of the open circuit voltage for a-Si:H n-i-p solar cells by incorporation of protocrystalline Si:H p-type layers

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In studies of hydrogenated amorphous silicon (a-Si:H) n–i–p solar cells fabricated by rf plasma-enhanced chemical vapor deposition (PECVD), we have found that the maximum open circuit voltage (Voc) is obtained by incorporating p-type doped Si:H layers that are protocrystalline in nature. Specifically, these optimum p layers are prepared by PECVD in the a-Si:H growth regime using the maximum hydrogen-to-silane flow ratio possible without crossing the thickness-dependent transition into the mixed-phase (amorphous+microcrystalline) growth regime for the ∼200 Å p-layer thickness. The strong dependence of the p-layer phase and solar cell Voc on the underlying i-layer phase also confirms the protocrystalline nature of the optimum Si:H p layer.

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